DocumentCode :
3271501
Title :
Single versus double ion implantation defined AlGaAs/GaAs quantum well waveguide
Author :
Li, Alex T H ; Li, E. Herbert
Author_Institution :
Dept. of Electr. & Electron. Eng., Hong Kong Univ., Hong Kong
Volume :
2
fYear :
1997
fDate :
10-13 Nov 1997
Firstpage :
453
Abstract :
The purpose of this work is to investigate ion implantations on a two-dimensional optical waveguide structure. The waveguide structure, to be analyzed here consists of an AlGaAs-GaAs MQW on a thick AlGaAs buffer layer
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; ion implantation; optical waveguides; semiconductor quantum wells; AlGaAs-GaAs; AlGaAs-GaAs MQW; AlGaAs-GaAs quantum well waveguide; double ion implantation; single ion implantation; thick AlGaAs buffer layer; two-dimensional optical waveguide structure; waveguide structure; Gallium arsenide; Implants; Impurities; Ion implantation; Optical mixing; Optical refraction; Optical waveguides; Quantum well devices; Refractive index; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics Society Annual Meeting, 1997. LEOS '97 10th Annual Meeting. Conference Proceedings., IEEE
Conference_Location :
San Francisco, CA
ISSN :
1092-8081
Print_ISBN :
0-7803-3895-2
Type :
conf
DOI :
10.1109/LEOS.1997.645513
Filename :
645513
Link To Document :
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