DocumentCode :
3271507
Title :
Laterally-driven RF microswitch with high isolation
Author :
Kamide, Sho ; Suzuki, Kenichiro
Author_Institution :
Coll. of Sci. & Eng., Ritsumeikan Univ., Shiga, Japan
fYear :
2005
fDate :
25-28 Oct. 2005
Firstpage :
212
Lastpage :
213
Abstract :
Most of MEMS microswitches that have been so far reported utilize a movable electrode moving vertically to a substrate. Especially, few researches have been made to apply a lateral motional MEMS microswitch to a high frequency range (above several GHz). Although the insertion loss is kept low in a wide range up to a high frequency, the isolation usually becomes worse with the increase of the signal frequency. We have improved the isolation in a high frequency by using lateral motion in mutually opposite directions. In addition, this lateral movement is effective to alleviate the adhesion of a contact area. We also consider about the feasibility of a silicon RF transmission line, which helps the process very easy because of keeping the overall structure simple. The microswitch under investigation has a simple structure and can be fabricated by the easy process. Its isolation is excellent as well as insertion loss even for a use in RF range. Rapid growing demands for more data traffic flow in mobile-phones and wireless LAN´s tend to use a higher frequency band. Although the current microswitch has several improvements left, its excellent feature will make it more useful near the future.
Keywords :
isolation technology; microswitches; MEMS microswitches; RF microswitch; silicon RF transmission line; Contacts; Electrodes; Electrostatics; Insertion loss; Micromechanical devices; Microswitches; Radio frequency; Silicon; Switches; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2005 International
Print_ISBN :
4-9902472-2-1
Type :
conf
DOI :
10.1109/IMNC.2005.203813
Filename :
1595289
Link To Document :
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