Title :
Optimization of sub-wavelength texturing structures in solar cells by utilizing modified illumination and defocus techniques in optical lithography
Author :
Chen, H.L. ; Fan, Wonder ; Huang, K.T. ; Lin, C.H. ; Hsieh, K.C.
Author_Institution :
Dept. of Mater. Sci. & Eng., National Taiwan Univ., Taipei, Taiwan
Abstract :
In this paper, we demonstrate a simple method, combining conventional optical lithography and reactive ion etching (RIE) processes to fabricate an optimized pyramid structure by tuning the defocusing distance and expose dosage of an optical stepper as shown.
Keywords :
lighting; photolithography; solar cells; sputter etching; surface texture; defocus technique; defocusing distance; expose dosage; modified illumination; optical lithography; optical stepper; optimized pyramid structure; reactive ion etching; solar cell; sub-wavelength texturing structure; Etching; Lighting; Lithography; Optical diffraction; Optical reflection; Optical refraction; Optical variables control; Photovoltaic cells; Reflectivity; Resists;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2005 International
Print_ISBN :
4-9902472-2-1
DOI :
10.1109/IMNC.2005.203822
