Potential distribution in resistivity measurement for nanorods formed by electron beam induced deposition

Author

Takeguchi, M. ; Shimojo, M. ; Tanald, M. ; Mitsuishi, M. ; Che, R. ; Zhang, W. ; Furuya, K.

Author_Institution

High Voltage Electron Microscopy Station, Nat. Inst. for Mater. Sci., Tsukuba, Japan

fYear

2005

fDate

25-28 Oct. 2005

Firstpage

232

Lastpage

233

Abstract

In the present work, EBID nanorods formed on a metal substrate and on tungsten tip were made contact in a transmission electron microscope (TEM) and its current vs. potential characteristics were measured in-situ. Electron holography was attempted to observe a local potential distribution (e.g., local resistance distribution) during the current-potential measurement.

Keywords

electric current measurement; electrical resistivity; electron beam deposition; electron holography; nanoelectronics; nanostructured materials; transmission electron microscopy; EBID; current-potential measurement; electron beam induced deposition; electron holography; metal substrate; nanorod; potential distribution; resistivity measurement; transmission electron microscope; tungsten tip; Conductivity measurement; Electrical resistance measurement; Electron beams; Holography; Materials science and technology; Nanoscale devices; Nanostructures; Nanowires; Transmission electron microscopy; Tungsten;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 2005 International

Print_ISBN

4-9902472-2-1

Type

conf

DOI

10.1109/IMNC.2005.203823

Filename

1595299