Title :
MCC system with CP
Author :
Yamada, Akio ; Yasuda, Hiroshi
Author_Institution :
ADVANTEST Corp., Saitama, Japan
Abstract :
Electron beam direct write (EBDW) is required as a lithography tool for a small and/or middle volume production of SOC devices. Throughput is a key issue of the EBDW. Multi-beam or multi-column concepts have been proposed at various sites for the throughput improvement. We present the multi-column-cell (MCC) system with character projection (CP) technology for a next EBDW system.
Keywords :
electron beam lithography; masks; CP technology; EBDW system; MCC system; SOC devices; character projection technology; electron beam direct write system; multi-column-cell system; Apertures; Blanking; Control systems; Digital circuits; Electrons; Electrostatics; Facsimile; Lenses; Power supplies; Throughput;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2005 International
Print_ISBN :
4-9902472-2-1
DOI :
10.1109/IMNC.2005.203825
