• DocumentCode
    3271734
  • Title

    E-beam data preparation method for forming ultra fine curved patterns in silicon microphotonic circuit

  • Author

    Watanabe, Toshifumi ; Tsuchizawa, Tai ; Yamada, Koji ; Fukuda, Hiroshi ; Itabashi, Seiichi

  • Author_Institution
    NTT Microsyst. Integration Labs., Atsugi, Japan
  • fYear
    2005
  • fDate
    25-28 Oct. 2005
  • Firstpage
    240
  • Lastpage
    241
  • Abstract
    We have developed a data preparation method for e-beam writers that improved their ability to fabricate ultra fine curved patterns.
  • Keywords
    electron beam lithography; integrated optics; silicon; E-beam data preparation method; Si; e-beam writers; silicon microphotonic circuit; ultra fine curved patterns; Coupling circuits; Integrated optics; Laboratories; Optical coupling; Optical fiber networks; Optical ring resonators; Optical waveguides; Shape; Silicon; Wire;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 2005 International
  • Print_ISBN
    4-9902472-2-1
  • Type

    conf

  • DOI
    10.1109/IMNC.2005.203827
  • Filename
    1595303
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3271734