Title :
Fabrication of multi-layered structure by advanced reversal imprints lithography
Author :
Nishihata, Masayoshi ; Okuda, Keisuke ; Aoyama, Takashi ; Yoshikawa, Takashi ; Hirai, Yoshihiko
Author_Institution :
Graduate Sch. of Eng., Osaka Prefecture Univ., Japan
Abstract :
Advanced reversal imprint process to eliminate the breaking defects at the pattern edge is newly proposed and demonstrate contact window pattern transfer on the lower layer. We believe this technology is promising for advanced μ-TAS devices or bio-chips containing multi-layered micro fluid channels for 3-dimensional multi-layered structures.
Keywords :
nanolithography; 3D multilayered structures; advanced μ-TAS devices; advanced reversal imprints lithography; bio-chips; multilayered micro fluid channels; multilayered structure fabrication; pattern edge; pattern transfer; Coatings; Glass; Lithography; Optical device fabrication; Optical microscopy; Polymer films; Scanning electron microscopy; Shape; Surface tension; Temperature;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2005 International
Print_ISBN :
4-9902472-2-1
DOI :
10.1109/IMNC.2005.203833
