Title :
Fabrication of a gated cold cathode by using the inkjet embedding method
Author :
Baba, Akiyoshi ; Asano, Tanemasa
Author_Institution :
Center for Microelectron. Syst., Kyushu Inst. of Technol., Fukuoka, Japan
Abstract :
In this paper, we report the fabrication method of the gated cold cathode using the inkjet embedding method and field electron emission characteristics of the gated cold cathode. The gated cold cathode was fabricated by combining photolithography and inkjet printing. The photolithography was used to open a gate hole array. The inkjet printing was used to embed carbon black ink into the gate holes.
Keywords :
carbon; cathodes; electron emission; gold; ink jet printers; photolithography; carbon black ink; field electron emission; gate hole array; gate holes; gated cold cathode fabrication; inkjet embedding; inkjet printing; photolithography; Anodes; Carbon dioxide; Cathodes; Electron emission; Fabrication; Ink; Lithography; Printing; Surface treatment; Voltage;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2005 International
Print_ISBN :
4-9902472-2-1
DOI :
10.1109/IMNC.2005.203846
