• DocumentCode
    3272672
  • Title

    Static and dynamic power management in 14nm FDSOI technology

  • Author

    Weber, O. ; Josse, E. ; Mazurier, J. ; Haond, M.

  • Author_Institution
    MINATEC, CEA-Leti, Grenoble, France
  • fYear
    2015
  • fDate
    1-3 June 2015
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    This work presents a 14nm technology designed for high speed and energy efficient applications using FDSOI transistors. -34% speed delay at same static power with -100mV Vdd supply voltage operation vs 28nm FDSOI is demonstrated. The specific FDSOI features for adjusting the threshold voltage and managing power are highlighted in this paper. It is shown that a light channel doping and reverse back bias are effective to reduce the static leakage and, on the other hand, forward back bias (FBB) can provide dynamic power saving at same speed. All this process & design techniques, in addition to the poly bias capability, makes FDSOI a highly flexible technology to maximize the speed/leakage/power compromise for each application product.
  • Keywords
    energy conservation; semiconductor doping; silicon-on-insulator; FBB; FDSOI transistor technology; dynamic power management; dynamic power saving; energy efficiency; fully depleted silicon on insulator; light channel doping; reverse back bias; size 14 nm; size 28 nm; static leakage reduction; static power management; voltage -100 mV; Delays; Doping; Logic gates; MOSFET; Threshold voltage; Back bias; Dynamic Power; Fully Depleted silicon-on-insulator (FDSOI) technology; Mismatch; Static power; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    IC Design & Technology (ICICDT), 2015 International Conference on
  • Conference_Location
    Leuven
  • Type

    conf

  • DOI
    10.1109/ICICDT.2015.7165886
  • Filename
    7165886