DocumentCode
3272709
Title
Nonparabolicity and confinement effects of IIIV materials in novel transistors
Author
Pourghaderi, M. Ali ; Mocuta, Anda ; Thean, Aaron
Author_Institution
IMEC, Heverlee, Belgium
fYear
2015
fDate
1-3 June 2015
Firstpage
1
Lastpage
3
Abstract
Employing a 8 band k.p solver, the self-consistent band structure of the rectangular IIIV nanowires (NW) has been calculated. It is shown that the strong confinement combined with the band nonparabolicity will considerably change the effective masses and the band gap. The mass tensor elements get heavier than the bulk values and improve the density of state (DOS) and centroid capacitance accordingly, while in return the mobility will be degraded. The band widening has also been calculated for different width and height combinations. It is shown that oxide thickness scaling cannot compensate the poor DOS of IIIV, where the silicon device exhibits a continuous performance boost by thinning the oxide layer. Possible improvements of DOS through the width and the mole fraction modulation have been investigated.
Keywords
electronic density of states; energy gap; nanowires; silicon; 8 band kp solver; DOS; III-V nanowire; NW; band gap; band widening; centroid capacitance; confinement effect; density of state; mass tensor element; mole fraction modulation; nonparabolicity; oxide layer thinning; oxide thickness scaling; self-consistent band structure; silicon device; transistor; Capacitance; Effective mass; Indium gallium arsenide; Logic gates; Photonic band gap; Silicon; Wires;
fLanguage
English
Publisher
ieee
Conference_Titel
IC Design & Technology (ICICDT), 2015 International Conference on
Conference_Location
Leuven
Type
conf
DOI
10.1109/ICICDT.2015.7165888
Filename
7165888
Link To Document