DocumentCode :
3272758
Title :
MEMS-fabricated micro vacuum electron devices (μVEDs) for terahertz (THz) applications
Author :
Shin, Young-Min ; Barnett, Larry R. ; Luhmann, Neville C., Jr.
Author_Institution :
Dept. of Appl. Sci., Univ. of California, Davis, CA
fYear :
2008
fDate :
15-19 Sept. 2008
Firstpage :
1
Lastpage :
3
Abstract :
New types of micro vacuum electron devices (muVEDs) for high power and broadband applications in the THz and sub-THz regimes are presented. We have developed advanced MEMS techniques permitting the fabrication and onchip integration of muVED circuit elements based on photolithography and chemical etching.
Keywords :
etching; micromechanical devices; photolithography; submillimetre wave devices; vacuum microelectronics; MEMS techniques; VED; chemical etching; high power applications; microvacuum electron devices; onchip integration; photolithography; Bandwidth; Chemical elements; Circuit simulation; Electron beams; Electron devices; Electronic circuits; Etching; Frequency; Lithography; Micromechanical devices;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Infrared, Millimeter and Terahertz Waves, 2008. IRMMW-THz 2008. 33rd International Conference on
Conference_Location :
Pasadena, CA
Print_ISBN :
978-1-4244-2119-0
Electronic_ISBN :
978-1-4244-2120-6
Type :
conf
DOI :
10.1109/ICIMW.2008.4665430
Filename :
4665430
Link To Document :
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