Title :
A virtual equipment as a test bench for evaluating Virtual Metrology algorithms
Author :
Mattes, Andreas ; Koitzsch, Matthias ; Lewke, Dirk ; Müller-Zell, Michael ; Schellenberger, Martin
Author_Institution :
Fraunhofer Inst. of Integrated Syst. & Device Technol. (IISB), Erlangen, Germany
Abstract :
This paper presents a Virtual Equipment which serves as a testing environment for evaluating Virtual Metrology (VM) algorithms prior to their implementation into semiconductor fab structures. The Virtual Equipment merges statistical simulation with physical simulation to generate test data sets for various common and uncommon states of the processing equipment. The input data is based on historical fab data and synthetically generated data. Main result of the presented work is the bidirectional link of statistical methods with physical simulations which is the core of the virtual test environment. The testing of VM algorithms can be controlled via a Graphical User Interface (GUI). A simplified physical simulation of a Chemical Vapor Deposition (CVD) reaction chamber is set up based on CAD data as an example of the physical simulation part.
Keywords :
CAD; chemical reactors; chemical vapour deposition; graphical user interfaces; production engineering computing; semiconductor industry; statistical analysis; virtual instrumentation; CAD data; VM algorithm; bidirectional link; chemical vapor deposition reaction chamber; graphical user interface; physical simulation; processing equipment; semiconductor fab structures; statistical simulation; test data sets; virtual equipment; virtual metrology algorithm; virtual test environment; Data models; Graphical user interfaces; Mathematical model; Metrology; Semiconductor device modeling; Solid modeling; Statistical analysis;
Conference_Titel :
Simulation Conference (WSC), Proceedings of the 2011 Winter
Conference_Location :
Phoenix, AZ
Print_ISBN :
978-1-4577-2108-3
Electronic_ISBN :
0891-7736
DOI :
10.1109/WSC.2011.6147902