Title :
Application of tool science techniques to improve tool efficiency for a dry etch cluster tool
Author :
Havey, Robert ; Wang, Lixin ; Kim, DongJin
Author_Institution :
Micron Technol. Inc., Manassas, VA, USA
Abstract :
Semiconductor manufacturing is a capital-intensive industry. How to utilize billions of dollars of equipment as efficiently as possible is a critical factor for a semiconductor manufacturer to succeed in stiff competition. Unlike operations management techniques, like planning and scheduling, which are proven to improve tool performance by controlling WIP (work-in-process) movement, tool science techniques focus on tool architecture, components and operations inside the tool. In this paper, we first studied process time behavior of a cluster tool and fixed inefficient process sequence. A Petri Net model was then created to determine the internal bottleneck component of the tool. Results indicated that tool science techniques helped improve tool efficiency and resulted in significant cost savings.
Keywords :
Petri nets; etching; production equipment; production planning; scheduling; semiconductor device manufacture; semiconductor industry; work in progress; Petri net model; WIP; capital-intensive industry; dry etch cluster tool; operations management techniques; planning; scheduling; semiconductor manufacturer; semiconductor manufacturing; tool efficiency; tool science techniques; work-in-process; Analytical models; Asynchronous transfer mode; Image color analysis; Job shop scheduling; Robots; Semiconductor device modeling; Throughput;
Conference_Titel :
Simulation Conference (WSC), Proceedings of the 2011 Winter
Conference_Location :
Phoenix, AZ
Print_ISBN :
978-1-4577-2108-3
Electronic_ISBN :
0891-7736
DOI :
10.1109/WSC.2011.6147906