DocumentCode :
3273661
Title :
Low Stress Program and Single Wordline Erase Schemes for NAND Flash Memory
Author :
Kim, Jin-Ki ; Pyeon, Hong-Beom ; Oh, HakJune ; Schuetz, Roland ; Gillingham, Peter
Author_Institution :
MOSAID Technol. Inc., Ottawa
fYear :
2007
fDate :
26-30 Aug. 2007
Firstpage :
19
Lastpage :
20
Abstract :
Voltage stress during programming is a major factor limiting reliability in NAND Flash memory. To control programming stress several desirable features such as random page program, partial page program, and low Vcc operation are eliminated or restricted. Program stress becomes more significant as process technology is scaled down and as single-level cell (SLC) gives way to multi-level cell (MLC) devices. To increase device reliability a low stress program scheme for random page program in SLC devices and a sequential program scheme for MLC devices is introduced. Separately, system-level performance degrades as a function of the NAND block size due to the additional operations necessitated by wear-leveling algorithms. Techniques for single wordline erase in SLC and partial block erase in MLC are introduced to minimize system overhead due to larger block size and to extend the system lifetime.
Keywords :
flash memories; NAND flash memory; multi-level cell; random page program; sequential program scheme; single wordline erase schemes; single-level cell; Boosting; Capacitance; Degradation; Energy consumption; Flash memory; Geometry; Interference; Size control; Stress control; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Non-Volatile Semiconductor Memory Workshop, 2007 22nd IEEE
Conference_Location :
Monterey, CA
Print_ISBN :
1-4244-0753-2
Electronic_ISBN :
1-4244-0753-2
Type :
conf
DOI :
10.1109/NVSMW.2007.4290563
Filename :
4290563
Link To Document :
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