A Novel Flash-based FPGA Technology with Deep Trench Isolation

A highly scalable flash-based Field Programmable Gate Array (FPGA) technology has been achieved with Deep Trench Isolation (DTI). The DTI allows for a reduced cell size and enables Independent Pwell (IPW) array operation. The IPW FPGA array operation requires less than + 10 V during Uniform Channel FN-FN programming and shows negligible gate disturb. Additionally, it eliminates Gate-Induced Drain Leakage (GIDL) during programming. Characterization of a FPGA cell and array with 90 nm design rules is demonstrated with excellent electrical characteristics.