Anomalous dielectric dispersion in tantalum oxide films prepared by RF sputtering

Dielectric properties (ε and tan δ) of thin sputtered tantalum oxide films have been measured in the low frequency range. Anomalous large values of ε and tan δ have been observed at high temperatures above 100°C. The explicit thickness dependence exists in the frequency dependence of ε and tan δ. These results have been interpreted by Maxwell-Wagner theory