DocumentCode
3278380
Title
A Fast 2D Numerical Algorithm for Photolithography Applications
Author
Yuan, Chi-Min
Author_Institution
IBM East Fishkill facility
fYear
1992
fDate
31 May-1 Jun 1992
Firstpage
45
Lastpage
49
Keywords
Analytical models; Bleaching; Circuit simulation; Equations; Light scattering; Lithography; Metrology; Optical scattering; Resists; Semiconductor device modeling;
fLanguage
English
Publisher
ieee
Conference_Titel
Numerical Modeling of Processes and Devices for Integrated Circuits, 1992. NUPAD IV. Workshop on
Print_ISBN
0-7803-0516-7
Type
conf
DOI
10.1109/NUPAD.1992.673845
Filename
673845
Link To Document