DocumentCode :
3280093
Title :
Confined fractal patterns in gelatin
Author :
Yang, Lung-Jieh ; Lee, Chia-Chan ; Chen, Po-Hung ; Hsu, Chih-Wen
Author_Institution :
Dept. of Mech. & Electromech. Eng., Tamkang Univ., Tamsui, Taiwan
fYear :
2011
fDate :
20-23 Feb. 2011
Firstpage :
49
Lastpage :
52
Abstract :
Fractal patterns are commonly found during the re-crystallization process of over-saturated solution. In this work, the authors initially choose the gelatin aqueous solution, of high weight percentage of 18.2-27.3 wt %, dissolved with excess amount (9 wt %) of a photo-sensitizer agent potassium dichromate (K2Cr2O7) and sodium chloride (NaCl) to generate the tree-like, dendrite, fractal micro structures with the feature size of 5-40 μm. They also tried to make the fractal patterns uniformly to some extent according to Feynman´s confinement statement. The smaller field for growing fractal gelatin has the survival percentage of 80 %, over the survival percentage of 55 % for the 5000 μm larger case. These fractal patterns are going to develop the application to the fabrication of new chaotic mixers.
Keywords :
fractals; gelatin; micromachining; micromechanical devices; recrystallisation; Feynman confinement statement; chaotic mixers; confined fractal pattern; fractal gelatin; fractal micro structures; gelatin aqueous solution; over-saturated solution; photo-sensitizer agent potassium dichromate; recrystallization process; sodium chloride; Art; Coatings; Etching; Fractals; Glass; Microscopy; Substrates; fractal pattern; gelatin;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nano/Micro Engineered and Molecular Systems (NEMS), 2011 IEEE International Conference on
Conference_Location :
Kaohsiung
Print_ISBN :
978-1-61284-775-7
Type :
conf
DOI :
10.1109/NEMS.2011.6017292
Filename :
6017292
Link To Document :
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