• DocumentCode
    3280093
  • Title

    Confined fractal patterns in gelatin

  • Author

    Yang, Lung-Jieh ; Lee, Chia-Chan ; Chen, Po-Hung ; Hsu, Chih-Wen

  • Author_Institution
    Dept. of Mech. & Electromech. Eng., Tamkang Univ., Tamsui, Taiwan
  • fYear
    2011
  • fDate
    20-23 Feb. 2011
  • Firstpage
    49
  • Lastpage
    52
  • Abstract
    Fractal patterns are commonly found during the re-crystallization process of over-saturated solution. In this work, the authors initially choose the gelatin aqueous solution, of high weight percentage of 18.2-27.3 wt %, dissolved with excess amount (9 wt %) of a photo-sensitizer agent potassium dichromate (K2Cr2O7) and sodium chloride (NaCl) to generate the tree-like, dendrite, fractal micro structures with the feature size of 5-40 μm. They also tried to make the fractal patterns uniformly to some extent according to Feynman´s confinement statement. The smaller field for growing fractal gelatin has the survival percentage of 80 %, over the survival percentage of 55 % for the 5000 μm larger case. These fractal patterns are going to develop the application to the fabrication of new chaotic mixers.
  • Keywords
    fractals; gelatin; micromachining; micromechanical devices; recrystallisation; Feynman confinement statement; chaotic mixers; confined fractal pattern; fractal gelatin; fractal micro structures; gelatin aqueous solution; over-saturated solution; photo-sensitizer agent potassium dichromate; recrystallization process; sodium chloride; Art; Coatings; Etching; Fractals; Glass; Microscopy; Substrates; fractal pattern; gelatin;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nano/Micro Engineered and Molecular Systems (NEMS), 2011 IEEE International Conference on
  • Conference_Location
    Kaohsiung
  • Print_ISBN
    978-1-61284-775-7
  • Type

    conf

  • DOI
    10.1109/NEMS.2011.6017292
  • Filename
    6017292