DocumentCode :
3280444
Title :
Redundancy method to assess electromigration lifetime in power Grid design
Author :
Ouattara, Boukary ; Doyen, Lise ; Ney, D. ; Mehrez, H. ; Bazargan-Sabet, P. ; Bana, Franck Lionel
Author_Institution :
STMicroelectron., Crolles, France
fYear :
2013
fDate :
13-15 June 2013
Firstpage :
1
Lastpage :
3
Abstract :
The tendency of semiconductor market to increase component density in small chip leads to reliability issues such as Electromigration (EM). This phenomenon becomes critical in deep submicron design technology. In this paper we assess chip power grid lifetimes by taking into account redundant paths contribution in case of EM degradation. The application of this method for wire lifetime validation of a 32nm microprocessor has reduced significantly wires susceptible to EM given by simulation tools.
Keywords :
electromigration; integrated circuit reliability; power grids; redundancy; EM degradation; chip power grid lifetimes; deep submicron design technology; electromigration lifetime; microprocessor; power grid design; redundancy method; wire lifetime validation; Degradation; Electromigration; Mathematical model; Power grids; Redundancy; Standards; Wires;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Interconnect Technology Conference (IITC), 2013 IEEE International
Conference_Location :
Kyoto
Print_ISBN :
978-1-4799-0438-9
Type :
conf
DOI :
10.1109/IITC.2013.6615570
Filename :
6615570
Link To Document :
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