• DocumentCode
    3281042
  • Title

    Studies of the electromechanical coupling characteristics based on cantilever-mass

  • Author

    Xue, Chenyang ; Tan, Zhenxin ; Shi, Weili ; Liu, Jun ; Zhang, Binzhen ; Xiong, Jijun ; Zhang, Wendong

  • Author_Institution
    Key Lab. of Instrum. Sci. & Dynamic Meas. Minist. of Educ., North Univ. of China, Taiyuan, China
  • fYear
    2011
  • fDate
    20-23 Feb. 2011
  • Firstpage
    254
  • Lastpage
    257
  • Abstract
    The paper reports a GaAs cantilever-mass based on the electromechanical coupling characteristics using pseudomorphic high electron mobility field effect transistor (PHEMT) as the sensitive element. The GaAs PHEMT is embedded in the root of the cantilever to detect the nanometers deformation. The results indicate that the piezoresistive coefficient and sensitivity of microstructure strongly depend on the voltage bias. The saturated region shows a greater sensitivity and piezoresistive coefficient than linear region. And the maximum piezoresistive coefficient is three orders higher than that of silicon. These results will be useful to design high sensitivity sensors.
  • Keywords
    III-V semiconductors; cantilevers; electromechanical effects; gallium arsenide; high electron mobility transistors; micromechanical devices; piezoresistance; GaAs; PHEMT; cantilever-mass; electromechanical coupling; nanometer deformation; piezoresistive coefficient; pseudomorphic high electron mobility field effect transistor; voltage bias; Gallium arsenide; Logic gates; PHEMTs; Piezoresistance; Sensitivity; Silicon; Voltage measurement; GaAs; HEMT; drain bias; piezoresistive coefficient; sensitivity;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nano/Micro Engineered and Molecular Systems (NEMS), 2011 IEEE International Conference on
  • Conference_Location
    Kaohsiung
  • Print_ISBN
    978-1-61284-775-7
  • Type

    conf

  • DOI
    10.1109/NEMS.2011.6017342
  • Filename
    6017342