Intercalated multi-layer graphene grown by CVD for LSI interconnects

Author

Kondo, Daishi ; Nakano, Hisamatsu ; Bo Zhou ; Kubota, Ichiro ; Hayashi, K. ; Yagi, Keita ; Takahashi, Masaharu ; Sato, Mitsuhisa ; Sato, Seiki ; Yokoyama, Naoki

Author_Institution

Collaborative Res. Team Green Nanoelectron. Center (GNC), AIST, Tsukuba, Japan

fYear

2013

fDate

13-15 June 2013

Firstpage

1

Lastpage

3

Abstract

We have fabricated multi-layer graphene (MLG) wiring and demonstrated a resistivity of the same order as Cu and reliability better than Cu. The MLG was synthesized epitaxially by chemical vapor deposition (CVD) on an epitaxial Co film, resulting in quality and electrical properties as good as those of a graphite crystal. The MLG was further intercalated with FeCl₃ to achieve a resistivity as low as 9.1 μΩ cm. Our results show that intercalated MLG is really promising for future LSI interconnects.

Keywords

chemical vapour deposition; electrical resistivity; graphene; integrated circuit interconnections; integrated circuit reliability; large scale integration; C-Co; CVD; Co; LSI interconnects; chemical vapor deposition; epitaxial Co film; intercalated multilayer graphene; reliability; resistivity; Conductivity; Films; Graphene; Scanning electron microscopy; Substrates; Wiring;

fLanguage

English

Publisher

ieee

Conference_Titel

Interconnect Technology Conference (IITC), 2013 IEEE International

Conference_Location

Kyoto

Print_ISBN

978-1-4799-0438-9

Type

conf

DOI

10.1109/IITC.2013.6615600

Filename

6615600