• DocumentCode
    3281279
  • Title

    Study on N type 4H-SiC minority carrier lifetime by microwave photoconductivity decay technology

  • Author

    Qirong, Lu ; Dong-mei, Gao ; Yan-bing, Wei ; Bin, Huang

  • Author_Institution
    Center of Modern Educ. Technol., Guilin Univ. of Technol., Guilin, China
  • fYear
    2011
  • fDate
    15-17 April 2011
  • Firstpage
    1734
  • Lastpage
    1737
  • Abstract
    Microwave photoconductivity decay technology is used to measure the minority carrier lifetime of N type 4H SiC.Respectively setting the excitation intensity to 100%, 50%, 25% and 5% the minority carrier lifetime is measured. The results indicated that the minority carrier lifetime of N type 4H SiC sample is about 0.138μs and the incident laser intensity is not the main factor to increase or decrease the lifetime. But when the incident laser intensity is weakening, the signal wave amplitude is lessened and the noise is correspondingly increased. This means some weak signal measurement technology such as filter or smooth window must be used. The experiment indicated that Microwave photoconductivity decay technology is convenient and efficient to measure the N type carrier lifetime which have a great significance to 4H-SiC.
  • Keywords
    carrier lifetime; photoconductivity; silicon compounds; wide band gap semiconductors; N type 4H-SiC; SiC; incident laser intensity; microwave photoconductivity decay technology; minority carrier lifetime; signal measurement technology; Charge carrier lifetime; Masers; Microwave filters; Microwave measurements; Photoconductivity; Semiconductor device measurement; 4H-SiC; intensity; microwave photoconductivity; minority carrier lifetime;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electric Information and Control Engineering (ICEICE), 2011 International Conference on
  • Conference_Location
    Wuhan
  • Print_ISBN
    978-1-4244-8036-4
  • Type

    conf

  • DOI
    10.1109/ICEICE.2011.5777661
  • Filename
    5777661