A method to reduce notching effect on the anchors of a micro-gyroscope

Author

Hong, Peizhen ; Guo, Zhongyang ; Yang, Zhenchuan ; Yan, Guizhen

Author_Institution

Inst. of Microelectron., Peking Univ., Beijing, China

fYear

2011

fDate

20-23 Feb. 2011

Firstpage

338

Lastpage

341

Abstract

A novel three-step DRIE recipe with pulsed low frequency platen power of 380 KHz is proposed in this paper. The depassivation time/duty cycle and the etching time/duty cycle of the pulsed low frequency platen power in the etching step of Bosh process are experimentally studied through the silicon on glass process (SOG) of a micro-gyroscope. Experiments show that the recipe with a passivation time of 2s, a depassivation time/duty cycle of 2s/75% and a etching time/duty cycle of 4s/85% can effectively reduce the notching effect on the anchors of the gyroscope while keep good sidewall verticality and present no grass.

Keywords

anchors; gyroscopes; microfabrication; microsensors; sputter etching; SOG; Si; anchors; depassivation time-duty cycle; etching time/duty cycle; frequency 380 kHz; microgyroscope; notching effect reduction method; pulsed low frequency platen power; three-step DRIE recipe; time 2 s; Etching; Fabrication; Glass; Gyroscopes; Ions; Passivation; Silicon; LF platen power; gyroscope; notching effect; pulse bias; three step DRIE;

fLanguage

English

Publisher

ieee

Conference_Titel

Nano/Micro Engineered and Molecular Systems (NEMS), 2011 IEEE International Conference on

Conference_Location

Kaohsiung

Print_ISBN

978-1-61284-775-7

Type

conf

DOI

10.1109/NEMS.2011.6017362

Filename

6017362