Title :
Electrodeposition and characterization of CoNiMnP-based permanent magnetic film for MEMS applications
Author :
Sun, Xu-Ming ; Yuan, Quan ; Fang, Dong-Ming ; Zhang, Hai-Xia
Author_Institution :
Nat. Key Lab. of Sci. & Technol. on Micro/Nano Fabrication, Peking Univ., Beijing, China
Abstract :
Electroplated CoNiMnP-based permanent magnetic films with thickness of 4μm, 25μm and 43.5μm were fabricated and tested. Composed of 76.38 wt% Co, 16.66 wt% Ni, 3.64 wt% P and 2.32 wt% Mn, the films exhibited good surface morphology. In the case of 4μm thick film, we successfully achieved a high lateral coercivity of 711Oe, a retentivity up to 8933Gs and an energy density of 16.9kJ/m3. The film thickness dependence of magnetic property was also investigated, showing a decrease of the retentivity and coercivity with the increase in thickness. In addition, it was observed that Zn as an additive could improve the surface morphology by eliminating micro cracks.
Keywords :
cobalt compounds; electroplating; magnetic thin films; manganese compounds; micromechanical devices; nickel compounds; permanent magnets; surface morphology; CoNiMnP; MEMS; electrodeposition; energy density; magnetic property; microcracks elimination; permanent magnetic film; size 25 Mm; size 4 mum; size 43.5 mum; surface morphology; Coercive force; Magnetic films; Magnetic hysteresis; Magnetic properties; Magnetomechanical effects; Micromechanical devices; CoNiMnP; Electrodeposition; Hysteresis loops; Permanent film;
Conference_Titel :
Nano/Micro Engineered and Molecular Systems (NEMS), 2011 IEEE International Conference on
Conference_Location :
Kaohsiung
Print_ISBN :
978-1-61284-775-7
DOI :
10.1109/NEMS.2011.6017369
