• DocumentCode
    3281597
  • Title

    A nanochannel system fabricated by MEMS microfabrication and atomic force microscopy

  • Author

    Wang, Zhiqian ; Wang, Dong ; Jiao, Niandong ; Tung, Steve ; Dong, Zaili

  • fYear
    2011
  • fDate
    20-23 Feb. 2011
  • Firstpage
    372
  • Lastpage
    376
  • Abstract
    A silicon nanochannel system with integrated transverse electrodes was designed and fabricated by combining MEMS microfabrication and AFM nanolithography. The fabrication process began with the patterning of microscale reservoirs and electrodes on an oxidized silicon chip using conventional MEMS techniques. A nanochannel, approximately 30μm long with a small semi-circular cross-sectional area of 20nm by 200nm, was then mechanically machined on the oxide surface between the micro reservoirs by applying AFM nanolithography with an all-diamond probe. Anodic bonding was used to seal off the nanochannel with a matching Pyrex cover. Continuous flow in the nanochannel was verified by pressurizing a solution of fluorescein isothiocyanate (FITC) in ethanol through the channel in a vacuum chamber. It was further demonstrated by driving carboxyl-modified FluoSpheres® (diameter ~ 20 nm) through the nanochannel with an external electric field. Presence of the FluoSpheres® in the channel was indicated by a sharp increase in current between the transverse electrodes.
  • Keywords
    atomic force microscopy; electrodes; micromechanical devices; nanoelectromechanical devices; nanolithography; silicon; AFM nanolithography; FITC; MEMS microfabrication; anodic bonding; atomic force microscopy; carboxyl-modified FluoSpheres; electric field; ethanol; fluorescein isothiocyanate; microscale reservoir; oxidized silicon chip; silicon nanochannel system; transverse electrode; Bonding; Electrodes; Force; Nanolithography; Reservoirs; Silicon; Atomic force microscopy (AFM); Nanochannel; Nanofluidics; Nanolithography;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nano/Micro Engineered and Molecular Systems (NEMS), 2011 IEEE International Conference on
  • Conference_Location
    Kaohsiung
  • Print_ISBN
    978-1-61284-775-7
  • Type

    conf

  • DOI
    10.1109/NEMS.2011.6017370
  • Filename
    6017370