• DocumentCode
    3281775
  • Title

    Piezoresistive CMOS sensors for out-of-plane shear stress

  • Author

    Baumann, M. ; Lemke, B. ; Ruther, P. ; Paul, O.

  • Author_Institution
    Dept. of Microsyst. Eng., Univ. of Freiburg, Freiburg, Germany
  • fYear
    2009
  • fDate
    25-28 Oct. 2009
  • Firstpage
    441
  • Lastpage
    444
  • Abstract
    This paper reports the development and characterization of a novel piezoresistive CMOS stress sensor enabling the measurement of the out-of-plane shear stress components ¿xz and ¿yz by exploiting the shear piezoresistive effect, i.e. the pseudo-Hall effect. The sensing structures are fabricated using a commercial CMOS process. They include a vertical current channel and two pseudo-Hall sensing contacts. In order to characterize the sensor elements, a setup comprising a silicon bridge with SU-8 posts was developed to induce well defined and homogeneous vertical shear stress in the chip surface. This vertical shear stress setup is analyzed using finite-element (FE) simulations. Measurements demonstrating the sensor concept show a linear sensor response with a sensitivity of 0.092 V/(A MPa).
  • Keywords
    CMOS integrated circuits; finite element analysis; piezoresistive devices; sensors; finite-element simulations; out-of-plane shear stress; piezoresistive CMOS sensors; pseudo-Hall effect; pseudo-Hall sensing contacts; shear piezoresistive effect; vertical current channel; Analytical models; Bridges; CMOS process; Finite element methods; Iron; Piezoresistance; Semiconductor device measurement; Sensor phenomena and characterization; Silicon; Stress measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Sensors, 2009 IEEE
  • Conference_Location
    Christchurch
  • ISSN
    1930-0395
  • Print_ISBN
    978-1-4244-4548-6
  • Electronic_ISBN
    1930-0395
  • Type

    conf

  • DOI
    10.1109/ICSENS.2009.5398265
  • Filename
    5398265