Zernike representation of angle-resolved Mueller matrix for dimensional analysis of nanoscale structures

Author

Chen, Xiuguo ; Liu, Shiyuan ; Zhang, Chuanwei ; Ma, Yuan

Author_Institution

Wuhan Nat. Lab. for Optoelectron., Huazhong Univ. of Sci. & Technoloy, Wuhan, China

fYear

2011

fDate

20-23 Feb. 2011

Firstpage

507

Lastpage

510

Abstract

The angle-resolved Mueller matrix polarimetry has been recently introduced for dimensional metrology of nanoscale structures. Due to the redundant information contained in the measured Mueller matrix, it is difficult to find the implicit relationship between the geometrical parameters of the structure and the elements of the Mueller matrix. In this paper, a novel method based on Zernike representation is proposed to simplify the analysis of the angle-resolved Mueller matrix. The simulation results have demonstrated that the Zernike coefficients can be applied as useful metrics for dimensional analysis of nanoscale structures.

Keywords

Zernike polynomials; matrix algebra; photolithography; polarimetry; proximity effect (lithography); Zernike representation; angle-resolved Mueller matrix polarimetry; dimensional analysis; dimensional metrology; nanoscale structures; Fitting; Gratings; Nanoscale devices; Optical scattering; Optical variables measurement; Polarimetry; Polynomials; Mueller matrix polarimetry; Zernike polynomial; angle-resolved; nanomanufacturing; nanometrolgy;

fLanguage

English

Publisher

ieee

Conference_Titel

Nano/Micro Engineered and Molecular Systems (NEMS), 2011 IEEE International Conference on

Conference_Location

Kaohsiung

Print_ISBN

978-1-61284-775-7

Type

conf

DOI

10.1109/NEMS.2011.6017404

Filename

6017404