Title :
Zernike representation of angle-resolved Mueller matrix for dimensional analysis of nanoscale structures
Author :
Chen, Xiuguo ; Liu, Shiyuan ; Zhang, Chuanwei ; Ma, Yuan
Author_Institution :
Wuhan Nat. Lab. for Optoelectron., Huazhong Univ. of Sci. & Technoloy, Wuhan, China
Abstract :
The angle-resolved Mueller matrix polarimetry has been recently introduced for dimensional metrology of nanoscale structures. Due to the redundant information contained in the measured Mueller matrix, it is difficult to find the implicit relationship between the geometrical parameters of the structure and the elements of the Mueller matrix. In this paper, a novel method based on Zernike representation is proposed to simplify the analysis of the angle-resolved Mueller matrix. The simulation results have demonstrated that the Zernike coefficients can be applied as useful metrics for dimensional analysis of nanoscale structures.
Keywords :
Zernike polynomials; matrix algebra; photolithography; polarimetry; proximity effect (lithography); Zernike representation; angle-resolved Mueller matrix polarimetry; dimensional analysis; dimensional metrology; nanoscale structures; Fitting; Gratings; Nanoscale devices; Optical scattering; Optical variables measurement; Polarimetry; Polynomials; Mueller matrix polarimetry; Zernike polynomial; angle-resolved; nanomanufacturing; nanometrolgy;
Conference_Titel :
Nano/Micro Engineered and Molecular Systems (NEMS), 2011 IEEE International Conference on
Conference_Location :
Kaohsiung
Print_ISBN :
978-1-61284-775-7
DOI :
10.1109/NEMS.2011.6017404
