DocumentCode :
3282746
Title :
Design of highly reflective subwavelength diffraction gratings for use in a tunable spectrometer
Author :
Kerber, Maxwell ; Dick, Brian ; Fralick, Mark ; Jazo, Hugo ; Waters, Richard
Author_Institution :
Adv. Integrated Circuits & Sensors Branch, Space & Naval Warfare Syst. Center Pacific (SSC PAC), San Diego, CA, USA
fYear :
2009
fDate :
25-28 Oct. 2009
Firstpage :
1984
Lastpage :
1987
Abstract :
The design of highly reflective subwavelength gratings (SWGs) for use in a micro-electromechanical system (MEMS) tunable spectrometer is presented. The SWGs are designed to be polarization independent at an incident wavelength of 1.5 ¿m with high reflectivity over a 200 nm bandwidth. Two designs are considered; Model 1: a silicon layer with periodic air holes and Model 2: a stacked Si-SiO2-Si design with the last Si layer a periodic array of columns. The designs are simulated using a commercial rigorous coupled wave analysis (RCWA) software package. The RCWA software aids in the design of SWGs that have higher reflectance than traditional dielectric mirrors. Model 1 has a reflectance (R)>0.99 for lambda 1.37-1.6 ¿m. Model 2 has a R>0.99 for lambda 1.46-1.69 ¿m. Finally, both designs are modeled to create a Fabry-Perot cavity, and at an incident wavelength 1.5 ¿m, the designs have a reflection finesse of 1707 and 4452 for Model 1 and Model 2, respectively.
Keywords :
diffraction gratings; elemental semiconductors; infrared spectrometers; micro-optomechanical devices; mirrors; optical design techniques; optical tuning; reflectivity; silicon; silicon compounds; spectrometer accessories; surface enhanced Raman scattering; Fabry-Perot cavity; Raman spectrometers; SERS on a chip; Si-SiO2; dielectric mirror stack; microelectromechanical system; periodic air holes; periodic array; polarization independent SWG design; reflectance; reflection finesse; reflective subwavelength diffraction gratings; rigorous coupled wave analysis software package; subwavelength gratings; tunable spectrometer; wavelength 1.37 mum to 1.69 mum; Analytical models; Bandwidth; Diffraction gratings; Microelectromechanical systems; Micromechanical devices; Polarization; Reflectivity; Reluctance generators; Silicon; Spectroscopy;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Sensors, 2009 IEEE
Conference_Location :
Christchurch
ISSN :
1930-0395
Print_ISBN :
978-1-4244-4548-6
Electronic_ISBN :
1930-0395
Type :
conf
DOI :
10.1109/ICSENS.2009.5398315
Filename :
5398315
Link To Document :
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