DocumentCode
3282943
Title
Controlled Selective Epitaxy for 3-D LSI
Author
Zhang, X.X. ; Cho, H.S. ; Xianyu, W.X. ; Yin, H.X. ; Noguchi, T.
fYear
2005
fDate
Dec. 7-9, 2005
Firstpage
76
Lastpage
77
Keywords
Crystallization; Dry etching; Epitaxial growth; Gas insulation; Gas lasers; Large scale integration; Semiconductor films; Substrates; Surface contamination; Wet etching;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Device Research Symposium, 2005 International
Print_ISBN
1-4244-0083-X
Type
conf
DOI
10.1109/ISDRS.2005.1595985
Filename
1595985
Link To Document