DocumentCode :
3283177
Title :
Impact of Source/Drain Si1-yCy Stressors on the Strained Si NMOSFETs
Author :
Huang, Jacky ; Chang, S.T.
fYear :
2005
fDate :
Dec. 7-9, 2005
Firstpage :
107
Lastpage :
108
Keywords :
Capacitive sensors; Difference equations; Electron mobility; Etching; Lattices; MOSFETs; Poisson equations; Shape; Silicon carbide; Tensile stress;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Device Research Symposium, 2005 International
Print_ISBN :
1-4244-0083-X
Type :
conf
DOI :
10.1109/ISDRS.2005.1596001
Filename :
1596001
Link To Document :
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