مرکز منطقه ای اطلاع رساني علوم و فناوري - The Electrical Characteristics of Thin Gadolinium Oxide Films on Silicon Substrate by DC Reactive RF-sputtering

DocumentCode :

3283352

Title :

The Electrical Characteristics of Thin Gadolinium Oxide Films on Silicon Substrate by DC Reactive RF-sputtering

Author :

Pan, Tung-Ming ; Lai, Chao-Sung ; Hsu, Hui-Hsin ; Wang, Jer-Chyi ; Wang, Kuan-Di ; Chen, Chun-Lin ; Lin, Jian-Chi ; Lee, Jian-Der

fYear :

2005

fDate :

Dec. 7-9, 2005

Firstpage :

132

Lastpage :

133

Keywords :

Annealing; Capacitance; Electric variables; Frequency; Hafnium oxide; Leakage current; MOS capacitors; Semiconductor films; Silicon; Substrates;

fLanguage :

English

Publisher :

ieee

Conference_Titel :

Semiconductor Device Research Symposium, 2005 International

Print_ISBN :

1-4244-0083-X

Type :

conf

DOI :

10.1109/ISDRS.2005.1596015

Filename :

1596015

Link To Document :