Confined etchant layer technique (CELT) for micromanufacture

Author

Zhan, Dongping ; Han, Lianhuan ; Yang, Dezhi ; Jiang, Li-min ; Tang, Jing ; Sun, Jian-jun ; Shi, Kang ; Zhou, Jianzhang ; Tian, Zhong-Qun ; Tian, Zhao-Wu

Author_Institution

Dept. of Chem., Xiamen Univ., Xiamen, China

fYear

2011

fDate

20-23 Feb. 2011

Firstpage

863

Lastpage

867

Abstract

Confined etchant layer technique (CELT) is an electro-and/ or photo- chemically induced chemical etching method for micromanufacture originated by our research group, which is distinguished from the LIGA and EFAB. To obtain the micro-/nano- meter precision, there are three strategies of CELT: (1) electro- and/or photo- chemical generation of etchant on the surface of tool; (2) confining the etchant layer to a thickness of micro-/nano- meter; (3) Approaching tool to the workpiece for micromanufacturing. CELT have been proved successful in the micromanufacture on conductive, semiconductive and also insulate workpiece. In this paper, our work on CELT will be reviewed and future research will also be prospected.

Keywords

etching; microfabrication; CELT; EFAB; LIGA; confined etchant layer technique; electrophotochemical induced chemical etching method; micromanufacture; Chemicals; Etching; Fabrication; Metals; Microstructure; Three dimensional displays; 3D microstructure fabrication; Confined Etchant Layer Technique (CELT); chemical etching; chemical planarization; micromanufacture; super-smooth surface machining;

fLanguage

English

Publisher

ieee

Conference_Titel

Nano/Micro Engineered and Molecular Systems (NEMS), 2011 IEEE International Conference on

Conference_Location

Kaohsiung

Print_ISBN

978-1-61284-775-7

Type

conf

DOI

10.1109/NEMS.2011.6017490

Filename

6017490