Title :
Confined etchant layer technique (CELT) for micromanufacture
Author :
Zhan, Dongping ; Han, Lianhuan ; Yang, Dezhi ; Jiang, Li-min ; Tang, Jing ; Sun, Jian-jun ; Shi, Kang ; Zhou, Jianzhang ; Tian, Zhong-Qun ; Tian, Zhao-Wu
Author_Institution :
Dept. of Chem., Xiamen Univ., Xiamen, China
Abstract :
Confined etchant layer technique (CELT) is an electro-and/ or photo- chemically induced chemical etching method for micromanufacture originated by our research group, which is distinguished from the LIGA and EFAB. To obtain the micro-/nano- meter precision, there are three strategies of CELT: (1) electro- and/or photo- chemical generation of etchant on the surface of tool; (2) confining the etchant layer to a thickness of micro-/nano- meter; (3) Approaching tool to the workpiece for micromanufacturing. CELT have been proved successful in the micromanufacture on conductive, semiconductive and also insulate workpiece. In this paper, our work on CELT will be reviewed and future research will also be prospected.
Keywords :
etching; microfabrication; CELT; EFAB; LIGA; confined etchant layer technique; electrophotochemical induced chemical etching method; micromanufacture; Chemicals; Etching; Fabrication; Metals; Microstructure; Three dimensional displays; 3D microstructure fabrication; Confined Etchant Layer Technique (CELT); chemical etching; chemical planarization; micromanufacture; super-smooth surface machining;
Conference_Titel :
Nano/Micro Engineered and Molecular Systems (NEMS), 2011 IEEE International Conference on
Conference_Location :
Kaohsiung
Print_ISBN :
978-1-61284-775-7
DOI :
10.1109/NEMS.2011.6017490
