DocumentCode :
3283765
Title :
Calculation of the Electron Mobility in Silicon Inversion Layers: Dependence on Surface Orientation, Channel Direction, and Stress
Author :
Yang, I.-J. ; Peng, C.-Y. ; Chang, S.T. ; Liu, C.W.
fYear :
2005
fDate :
Dec. 7-9, 2005
Firstpage :
187
Lastpage :
188
Keywords :
Acoustic scattering; Compressive stress; Conductivity; Electron mobility; Light scattering; Optical scattering; Phonons; Semiconductor device modeling; Silicon; Tensile stress;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Device Research Symposium, 2005 International
Print_ISBN :
1-4244-0083-X
Type :
conf
DOI :
10.1109/ISDRS.2005.1596045
Filename :
1596045
Link To Document :
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