DocumentCode :
3284483
Title :
Characterization of Sputtered-TaN metal gate for SiO2 and HfO2 gate dielectrics
Author :
Zhao, Yijie ; Eberly, Brandon ; Shang, Huiling ; White, Marvin H.
fYear :
2005
fDate :
Dec. 7-9, 2005
Firstpage :
270
Lastpage :
271
Keywords :
Capacitance-voltage characteristics; Conductivity; Dielectric measurements; Dielectric substrates; Electrodes; Hafnium oxide; MOS capacitors; Performance evaluation; Semiconductor films; Sputtering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Device Research Symposium, 2005 International
Print_ISBN :
1-4244-0083-X
Type :
conf
DOI :
10.1109/ISDRS.2005.1596089
Filename :
1596089
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3284483
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