DocumentCode :
3284494
Title :
Al2O3 MIM capacitor with various metal bottom electrodes for DRAM applications
Author :
Do, Seung Woo ; Jang, Cheol Yeong ; Lee, Dae Gab ; Choi, Sung Hwan ; Lee, Yong Hyun
fYear :
2005
fDate :
Dec. 7-9, 2005
Firstpage :
272
Lastpage :
273
Keywords :
Capacitance measurement; Capacitance-voltage characteristics; Dielectric thin films; Electrodes; Iron; MIM capacitors; Metal-insulator structures; Random access memory; Temperature; Tin;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Device Research Symposium, 2005 International
Print_ISBN :
1-4244-0083-X
Type :
conf
DOI :
10.1109/ISDRS.2005.1596090
Filename :
1596090
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3284494
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