• DocumentCode
    3284494
  • Title

    Al2O3 MIM capacitor with various metal bottom electrodes for DRAM applications

  • Author

    Do, Seung Woo ; Jang, Cheol Yeong ; Lee, Dae Gab ; Choi, Sung Hwan ; Lee, Yong Hyun

  • fYear
    2005
  • fDate
    Dec. 7-9, 2005
  • Firstpage
    272
  • Lastpage
    273
  • Keywords
    Capacitance measurement; Capacitance-voltage characteristics; Dielectric thin films; Electrodes; Iron; MIM capacitors; Metal-insulator structures; Random access memory; Temperature; Tin;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Device Research Symposium, 2005 International
  • Print_ISBN
    1-4244-0083-X
  • Type

    conf

  • DOI
    10.1109/ISDRS.2005.1596090
  • Filename
    1596090
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3284494