DocumentCode
3284648
Title
Computational lithography and computational metrology for nanomanufacturing
Author
Liu, Shiyuan
Author_Institution
State Key Lab. of Digital Manuf. Equip. & Technol., Huazhong Univ. of Sci. & Technol., Wuhan, China
fYear
2011
fDate
20-23 Feb. 2011
Firstpage
1093
Lastpage
1099
Abstract
Nanomanufacturing refers to the manufacturing of products with feature dimensions at the nanometer scale. This paper presents the fundamental concepts and key issues of computational lithography and computational metrology for nanomanufacturing. We demonstrate their potentials and challenges by providing several examples carried out in our research group. We believe and expect that they will play a significant role in the future nanomanufacturing.
Keywords
measurement; nanofabrication; nanolithography; computational lithography; computational metrology; nanomanufacturing; nanometer scale manufacturing; Computational modeling; Inverse problems; Lithography; Metrology; Optical imaging; Optimization; computational lithography; computational metrology; model-based metrology; nanomanufacturing; nanometrology; optical meteology; optical proximity correction;
fLanguage
English
Publisher
ieee
Conference_Titel
Nano/Micro Engineered and Molecular Systems (NEMS), 2011 IEEE International Conference on
Conference_Location
Kaohsiung
Print_ISBN
978-1-61284-775-7
Type
conf
DOI
10.1109/NEMS.2011.6017547
Filename
6017547
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