Title :
Computational lithography and computational metrology for nanomanufacturing
Author_Institution :
State Key Lab. of Digital Manuf. Equip. & Technol., Huazhong Univ. of Sci. & Technol., Wuhan, China
Abstract :
Nanomanufacturing refers to the manufacturing of products with feature dimensions at the nanometer scale. This paper presents the fundamental concepts and key issues of computational lithography and computational metrology for nanomanufacturing. We demonstrate their potentials and challenges by providing several examples carried out in our research group. We believe and expect that they will play a significant role in the future nanomanufacturing.
Keywords :
measurement; nanofabrication; nanolithography; computational lithography; computational metrology; nanomanufacturing; nanometer scale manufacturing; Computational modeling; Inverse problems; Lithography; Metrology; Optical imaging; Optimization; computational lithography; computational metrology; model-based metrology; nanomanufacturing; nanometrology; optical meteology; optical proximity correction;
Conference_Titel :
Nano/Micro Engineered and Molecular Systems (NEMS), 2011 IEEE International Conference on
Conference_Location :
Kaohsiung
Print_ISBN :
978-1-61284-775-7
DOI :
10.1109/NEMS.2011.6017547
