DocumentCode

3285612

Title

Ab-initio Calculations for Indium Diffusion in Silicon

Author

Kwan-sun ; Hwang, Chi-Ok ; Won, Taeyoung

fYear

2005

fDate

Dec. 7-9, 2005

Firstpage

422

Lastpage

423

Keywords

Atomic measurements; Boron; CMOS process; CMOS technology; Electronic mail; Impurities; Indium; Ion implantation; Nanoscale devices; Silicon;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Device Research Symposium, 2005 International

Print_ISBN

1-4244-0083-X

Type

conf

DOI

10.1109/ISDRS.2005.1596166

Filename

1596166