Title :
Application of bismuth copper tantalate in internal barrier layer capacitors
Author :
Szwagierczak, D. ; Kulawik, J.
Author_Institution :
Krakow Div., Inst. of Electron Technol., Kraków, Poland
Abstract :
The paper presents synthesis and sintering procedure and dielectric properties of a new high permittivity perovskite material with the composition Bi2/3CuTa4O12 and the structure similar to that of Cu2Ta4O12. Complex impedance spectroscopic studies carried out at frequencies 10 Hz-2 MHz and in a wide temperature range from -55 to 700°C reveal two types of dielectric response of ceramic samples. The high-frequency and low-temperature response was attributed to grains, and the low-frequency and high-temperature one - to grain boundaries. The high dielectric permittivity at a level of 105 was suggested to be related to spontaneous formation of internal barrier layer capacitors. SEM and EDS studies confirmed the existence of semiconducting grains and more resistive grain boundaries in Bi2/3CuTa4O12 ceramics.
Keywords :
X-ray chemical analysis; bismuth compounds; ceramic capacitors; copper compounds; grain boundaries; permittivity; scanning electron microscopy; sintering; Bi0.67CuTa4O12; EDS; SEM; bismuth copper tantalate; ceramic samples; complex impedance spectroscopy; dielectric response; frequency 10 Hz to 2 MHz; grain boundaries; high dielectric permittivity; high permittivity perovskite material; high-frequency response; internal barrier layer capacitors; low-temperature response; semiconducting grains; sintering procedure; spontaneous formation; temperature -55 degC to 700 degC; Bismuth; Ceramics; Dielectrics; Grain boundaries; Impedance; Permittivity; Temperature distribution; bismuth copper tantalate; ceramics; dielectric properties; internal barrier layer capacitor;
Conference_Titel :
Applications of Ferroelectrics held jointly with 2012 European Conference on the Applications of Polar Dielectrics and 2012 International Symp Piezoresponse Force Microscopy and Nanoscale Phenomena in Polar Materials (ISAF/ECAPD/PFM), 2012 Intl Symp
Conference_Location :
Aveiro
Print_ISBN :
978-1-4673-2668-1
DOI :
10.1109/ISAF.2012.6297756