A new VOx thin film for uncooled infrared focal plane arrays

Author

Chen, Xiqu ; Lv, Qiang

Author_Institution

Dept. of Math. & Phys., Wuhan Polytech. Univ., Wuhan, China

fYear

2011

fDate

15-17 April 2011

Firstpage

3894

Lastpage

3897

Abstract

In this paper, a new VO_x thin film for uncooled infrared focal plane arrays is proposed. The proposed VO_x thin film is fabricated with a magnetron sputtering method and has particular optical properties for infrared wavelength. The fabricating technology of the VO_x thin film has low-temperature characteristics and is completely compatible with the fabricating process of CMOS integrated circuits for uncooled infrared focal plane array. Experimentally measured results indicate that the fabricated VO_x thin film is potential to be applied as optical detecting materials for medium-wavelength infrared (MWIR) and long-wavelength infrared (LWIR).

Keywords

CMOS integrated circuits; focal planes; optical properties; sputtering; vanadium compounds; CMOS integrated circuits; VO; infrared wavelength; long-wavelength infrared; magnetron sputtering method; medium-wavelength infrared; optical detecting materials; optical properties; thin film; uncooled infrared focal plane arrays; CMOS integrated circuits; Detectors; Imaging; Laser transitions; Millimeter wave technology; Optical device fabrication; Resistance; VOx; infrared; magnetron sputtering;

fLanguage

English

Publisher

ieee

Conference_Titel

Electric Information and Control Engineering (ICEICE), 2011 International Conference on

Conference_Location

Wuhan

Print_ISBN

978-1-4244-8036-4

Type

conf

DOI

10.1109/ICEICE.2011.5777914

Filename

5777914