DocumentCode :
3286509
Title :
Fabrication of ridge waveguides in LiNbO3
Author :
Weigand, Benjamin ; Stolze, Mareike ; Rübel, Felix ; L´huillier, Johannes ; Lenhard, Andreas ; Becher, Christoph ; Wolff, Sandra
Author_Institution :
Photonik-Zentrum Kaiserslautern e.V., Kaiserslautern, Germany
fYear :
2012
fDate :
9-13 July 2012
Firstpage :
1
Lastpage :
4
Abstract :
We have fabricated ridge waveguides in lithium niobate with sidewall roughness of 14 nm (rms) and sidewall angles of more than 71°. The use of thick electroplated metal masks for reactive ion etching (RIE) makes it possible to manufacture ridge structures with several microns in height. For light confinement towards the substrate we investigate direct heterobonding techniques. Due to the expected low transmission losses we envision future applications in the field of quantum optics.
Keywords :
lithium compounds; ridge waveguides; sputter etching; LiNbO3; RIE; electroplated metal masks; heterobonding techniques; lithium niobate; reactive ion etching; ridge waveguides; sidewall angles; sidewall roughness; transmission losses; Crystals; Etching; Lithium niobate; Optical device fabrication; Optical surface waves; Optical waveguides; Lithium niobate; direct heterobonding; reactive ion etching; ridge waveguides;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Applications of Ferroelectrics held jointly with 2012 European Conference on the Applications of Polar Dielectrics and 2012 International Symp Piezoresponse Force Microscopy and Nanoscale Phenomena in Polar Materials (ISAF/ECAPD/PFM), 2012 Intl Symp
Conference_Location :
Aveiro
Print_ISBN :
978-1-4673-2668-1
Type :
conf
DOI :
10.1109/ISAF.2012.6297792
Filename :
6297792
Link To Document :
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