Fabrication of ridge waveguides in LiNbO3

Author

Weigand, Benjamin ; Stolze, Mareike ; Rübel, Felix ; L´huillier, Johannes ; Lenhard, Andreas ; Becher, Christoph ; Wolff, Sandra

Author_Institution

Photonik-Zentrum Kaiserslautern e.V., Kaiserslautern, Germany

fYear

2012

fDate

9-13 July 2012

Firstpage

1

Lastpage

4

Abstract

We have fabricated ridge waveguides in lithium niobate with sidewall roughness of 14 nm (rms) and sidewall angles of more than 71°. The use of thick electroplated metal masks for reactive ion etching (RIE) makes it possible to manufacture ridge structures with several microns in height. For light confinement towards the substrate we investigate direct heterobonding techniques. Due to the expected low transmission losses we envision future applications in the field of quantum optics.

Keywords

lithium compounds; ridge waveguides; sputter etching; LiNbO₃; RIE; electroplated metal masks; heterobonding techniques; lithium niobate; reactive ion etching; ridge waveguides; sidewall angles; sidewall roughness; transmission losses; Crystals; Etching; Lithium niobate; Optical device fabrication; Optical surface waves; Optical waveguides; Lithium niobate; direct heterobonding; reactive ion etching; ridge waveguides;

fLanguage

English

Publisher

ieee

Conference_Titel

Applications of Ferroelectrics held jointly with 2012 European Conference on the Applications of Polar Dielectrics and 2012 International Symp Piezoresponse Force Microscopy and Nanoscale Phenomena in Polar Materials (ISAF/ECAPD/PFM), 2012 Intl Symp

Conference_Location

Aveiro

Print_ISBN

978-1-4673-2668-1

Type

conf

DOI

10.1109/ISAF.2012.6297792

Filename

6297792