• DocumentCode
    3287523
  • Title

    Comparison of TSV-based PDN-design effects using various stacking topology methods

  • Author

    Charles, Guy ; Franzon, Paul D.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., North Carolina State Univ., Raleigh, NC, USA
  • fYear
    2012
  • fDate
    21-24 Oct. 2012
  • Firstpage
    83
  • Lastpage
    86
  • Abstract
    In this study, we estimate, compare and analyze the PDN effects of four chip-stacking topologies. The chip-stacking topologies are: (1) F2B; (2) F2F; (3) B2F; and (4) B2B. The arrangement of various on-chip interconnect elements based on the chip-stacking topologies specific to the design of 3D IC-PDN, varies in impedance properties. To reduce the impedance effects NMOS decap unit cells are integrated into PDN system to suppress 3D-SSN. Conclusively, the results of the case study indicate B2F and F2B die stacking topologies results in lower impedance effects relative to F2F topology.
  • Keywords
    integrated circuit interconnections; network topology; three-dimensional integrated circuits; 3D IC-PDN; 3D-SSN; B2B; B2F; F2B; F2F; NMOS decap unit cells; TSV-based PDN-design effects; chip-stacking topologies; on-chip interconnect elements; power delivery network; Impedance; Metals; Silicon; Stacking; System-on-a-chip; Through-silicon vias; Topology; 3D IC; B2F and B2B; F2B; F2F; Power delivery network (PDN); Redistribution layer (RDL); SSN; Through silicon via (TSV); target impedance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electrical Performance of Electronic Packaging and Systems (EPEPS), 2012 IEEE 21st Conference on
  • Conference_Location
    Tempe, AZ
  • Print_ISBN
    978-1-4673-2539-4
  • Electronic_ISBN
    978-1-4673-2537-0
  • Type

    conf

  • DOI
    10.1109/EPEPS.2012.6457848
  • Filename
    6457848