DocumentCode :
3288223
Title :
Plasma Chemical Etching of Silicon
Author :
Bogomolov, B.K.
fYear :
2006
fDate :
26-28 Sept. 2006
Firstpage :
265
Lastpage :
266
Keywords :
Biological tissues; Chemicals; Electrodes; Etching; Plasma applications; Plasma chemistry; Plasma devices; Plasma materials processing; Plasma properties; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Instrument Engineering, 2006. APEIE '06. 8th International Conference on Actual Problems of
Conference_Location :
Novosibirsk, Russia
Print_ISBN :
5-7782-0662-3
Type :
conf
DOI :
10.1109/APEIE.2006.4292454
Filename :
4292454
Link To Document :
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