DocumentCode :
3289998
Title :
Effects of vacuum conditions on low frequency noise in silicon field emission devices
Author :
Trujlllo, J.T. ; Chakhovskoi, Andrei G. ; Hunt, Charles E.
Author_Institution :
Dept. of Electr. & Comput. Eng., California Univ., Davis, CA, USA
fYear :
1996
fDate :
7-12 Jul 1996
Firstpage :
133
Lastpage :
137
Abstract :
The effects of pressure on emission current noise have been studied. Field emission currents from silicon devices were observed over a range of pressures. The current fluctuations were analyzed in both the time and frequency domain. Signal to noise ratios between 0.9 and 6.9 were observed. These values appear to be more dependent on operation time than on pressures. Spectral density coefficients of low frequency measurements range from -1.37 to -1.81. Some pressure dependence is suggested in the lower pressure ranges. At higher pressures emission currents seem to be reduced and the current is cut off completely above a threshold pressure which is somewhere in the 10´s of Torr
Keywords :
1/f noise; current fluctuations; electron field emission; elemental semiconductors; pressure; semiconductor device noise; silicon; vacuum microelectronics; SNR; Si; Si field emission devices; current fluctuations; emission current noise; field emission currents; low frequency noise; pressure dependence; signal/noise ratios; spectral density coefficients; vacuum conditions; Anodes; Current measurement; Fluctuations; Frequency measurement; Low-frequency noise; Microelectronics; Noise measurement; Pollution measurement; Semiconductor device noise; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Microelectronics Conference, 1996. IVMC'96., 9th International
Conference_Location :
St. Petersburg
Print_ISBN :
0-7803-3594-5
Type :
conf
DOI :
10.1109/IVMC.1996.601790
Filename :
601790
Link To Document :
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