DocumentCode :
329143
Title :
Confined Selective Epitaxial Growth: Potential For Smart Silicon Sensor Fabrication
Author :
Bartek, M. ; Gennissen, P.T.J. ; French, P.J. ; Wolffenbuttel, R.F.
Author_Institution :
Delft University of Technology
Volume :
1
fYear :
1995
fDate :
25-29 Jun 1995
Firstpage :
91
Lastpage :
94
Keywords :
Annealing; Cleaning; Epitaxial growth; Etching; Fabrication; Intelligent sensors; Plasma applications; Plasma chemistry; Silicon on insulator technology; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Sensors and Actuators, 1995 and Eurosensors IX.. Transducers '95. The 8th International Conference on
Print_ISBN :
91-630-3473-5
Type :
conf
DOI :
10.1109/SENSOR.1995.717099
Filename :
717099
Link To Document :
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