DocumentCode :
329144
Title :
Selective Seeding Of Copper Films On Polyimide Patterned Silicon Substrate, Using Ion Implantation
Author :
Bhansali, S. ; Sood, D.K.
Author_Institution :
Royal Melbourne Institute of Technology
Volume :
1
fYear :
1995
fDate :
25-29 Jun 1995
Firstpage :
95
Lastpage :
98
Keywords :
Chemicals; Copper; Etching; Fabrication; Ion implantation; Lithography; Polyimides; Resists; Semiconductor films; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Sensors and Actuators, 1995 and Eurosensors IX.. Transducers '95. The 8th International Conference on
Print_ISBN :
91-630-3473-5
Type :
conf
DOI :
10.1109/SENSOR.1995.717100
Filename :
717100
Link To Document :
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