DocumentCode :
3292288
Title :
Spectroscopic detection of (i) intrinsic band edge defects, and (ii) transition metal (TM) and rare earth lanthanide (REL) atom occupied states in elemental and complex oxides: A novel pathway to (i) device reliability and (ii) increased functionality in
Author :
Lucovsky, Gerald ; Seo, Hyungtak ; Chung, Kwun-Bum ; Kim, Jinwu
Author_Institution :
Dept. of Phys., North Carolina State Univ., Raleigh, NC
fYear :
2009
fDate :
18-20 March 2009
Firstpage :
95
Lastpage :
98
Abstract :
A novel application of synchrotron soft-X-ray spectroscopy is applied to (i) the detection of intrinsic bonding defects, and (ii) partially occupied TM and REL atom valence band edge d-and d- and f-states. Spectroscopic identification and correlation with electrical performance is crucial for the identification and optimization of TM/REL elemental and complex oxides for advanced ULSI devices.
Keywords :
CMOS integrated circuits; ULSI; X-ray spectroscopy; optimisation; rare earth compounds; semiconductor device reliability; synchrotrons; ULSI CMOS; complex oxides; device reliability; elemental oxides; intrinsic band edge defects; intrinsic bonding defects; optimization; rare earth lanthanide atom; spectroscopic detection; synchrotron soft-X-ray spectroscopy; transition metal; valence band edge; Spectroscopy;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ultimate Integration of Silicon, 2009. ULIS 2009. 10th International Conference on
Conference_Location :
Aachen
Print_ISBN :
978-1-4244-3704-7
Type :
conf
DOI :
10.1109/ULIS.2009.4897547
Filename :
4897547
Link To Document :
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