DocumentCode :
3292361
Title :
Modeling of piezoresistive coefficients in Si hole inversion layers
Author :
Pham, A.T. ; Jungemann, C. ; Meinerzhagen, B.
Author_Institution :
Tech. Univ. Braunschweig, Braunschweig
fYear :
2009
fDate :
18-20 March 2009
Firstpage :
121
Lastpage :
124
Abstract :
A mobility model for hole inversion layers based on the self-consistent solution of the 6 times 6 koarr ldr poarr Schrodinger equation (SE) and Poisson equation (PE) has been developed. The mobility variation due to uniaxial stress and biaxial strain is simulated and the simulation results reproduce available measurements. The piezoresistive coefficient extraction technique based on the mobility variation due to uniaxial stress is generalized for general diamond crystal lattice material. The new derivation is applicable for arbitrary surface and channel orientations.
Keywords :
Poisson equation; Schrodinger equation; crystal structure; diamond; hole mobility; piezoresistive devices; Poisson equation; Schrodinger equation; biaxial strain; channel orientations; diamond crystal lattice material; mobility model; piezoresistive coefficients; self-consistent solution; silicon hole inversion layers; surface orientations; uniaxial stress; CMOS technology; Capacitive sensors; Crystallography; Lattices; Optical scattering; Piezoresistance; Poisson equations; Strain measurement; Stress measurement; Tensile stress;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ultimate Integration of Silicon, 2009. ULIS 2009. 10th International Conference on
Conference_Location :
Aachen
Print_ISBN :
978-1-4244-3704-7
Type :
conf
DOI :
10.1109/ULIS.2009.4897553
Filename :
4897553
Link To Document :
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