DocumentCode :
3292618
Title :
Negative substrate bias effects on collector resistance in SiGe HBTs on thin film SOI
Author :
Xu, Xiaobo ; Zhang, Heming ; Hu, Huiyong ; Qu, Jiangtao ; Ma, Jianli ; Qin, Shanshan
Author_Institution :
Key Lab. of Minist. of Educ. for Wide Band-Gap Semicond. Mater. & Devices, Xidian Univ., Xi´´an, China
fYear :
2011
fDate :
15-17 April 2011
Firstpage :
2380
Lastpage :
2382
Abstract :
An analytical expression for collector resistance of a novel vertical SiGe partially-depleted HBT on thin SOI is obtained under negative substrate biases. The resistance decreases slowly with the increase of substrate-collector bias and the influence on transit frequency is trivial and acceptable. The model is consistent with simulation result and found to be significant in the design and simulation of 0.13 μm millimeter wave SiGe SOI BiCMOS technology.
Keywords :
BiCMOS integrated circuits; Ge-Si alloys; field effect MIMIC; heterojunction bipolar transistors; semiconductor device models; semiconductor materials; semiconductor thin films; silicon-on-insulator; SiGe; collector resistance; millimeter wave SOI BiCMOS technology; negative substrate bias effects; negative substrate biases; partially-depleted HBT; size 0.13 mum; substrate-collector bias; thin film SOI; transit frequency; Capacitance; Heterojunction bipolar transistors; Resistance; Silicon; Silicon germanium; Substrates; Thyristors; SiGe; Substrate bias effect; collector resistance; heterojunction bipolar transistor (HBT);
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electric Information and Control Engineering (ICEICE), 2011 International Conference on
Conference_Location :
Wuhan
Print_ISBN :
978-1-4244-8036-4
Type :
conf
DOI :
10.1109/ICEICE.2011.5778282
Filename :
5778282
Link To Document :
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