• DocumentCode
    3292635
  • Title

    Multivariable nonlinear dynamic modeling based on DPLS and Hammerstein model and its application

  • Author

    Wang, Wei ; Zhao, Lijie ; Chai, Tianyou

  • Author_Institution
    Key Lab. of Integrated Autom. of Process Ind., Northeastern Univ., Shenyang, China
  • fYear
    2009
  • fDate
    15-18 Dec. 2009
  • Firstpage
    7303
  • Lastpage
    7308
  • Abstract
    Process data exhibits both nonlinear and dynamic characteristics. A multivariable nonlinear dynamic modeling method is proposed by combining dynamic partial least squares (DPLS) algorithm and Hammerstein model. This method applies Hammerstein model to the DPLS inner regression. The outer PLS algorithm with ARX inputs is used to model the dynamics of the process, and it is also used to reduce the dimensionality and to remove the collinearity. The inner Hammerstein model is used to capture the dynamics and nonlinearity. As illustration, the proposed method is implemented in the alumina production process to build the model of component concentration in sodium aluminate solution. The results show that the proposed approach is capable of modeling the complex chemical process, and much improved prediction performance is achieved over the conventional linear PLS model.
  • Keywords
    chemical engineering; multivariable systems; nonlinear systems; process control; regression analysis; Hammerstein model; alumina production process; complex chemical process; dimensionality; dynamic partial least squares algorithm; multivariable nonlinear dynamic modeling; nonlinearity; prediction performance; regression; sodium aluminate solution; Chemical processes; Data mining; Monitoring; Neural networks; Noise robustness; Nonlinear dynamical systems; Page description languages; Predictive models; Production; Robust stability;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Decision and Control, 2009 held jointly with the 2009 28th Chinese Control Conference. CDC/CCC 2009. Proceedings of the 48th IEEE Conference on
  • Conference_Location
    Shanghai
  • ISSN
    0191-2216
  • Print_ISBN
    978-1-4244-3871-6
  • Electronic_ISBN
    0191-2216
  • Type

    conf

  • DOI
    10.1109/CDC.2009.5399497
  • Filename
    5399497