Title :
Field emission properties of Mo-coated Si field emitter arrays and formation of molybdenum silicide
Author :
Ju, Byeong-Kwon ; Park, Heung-Woo ; Lee, Yun-Hi ; Chung, In-Jae ; Haskard, M.R. ; Park, Jung-Ho ; Oh, Myung-Hwan
Author_Institution :
Dept. of Electron. & Inf. Technol., Korea Inst. of Sci. & Technol., Seoul, South Korea
Abstract :
Uniform and reproducible silicon tip arrays were fabricated using the reactive ion etching followed by the re-oxidation sharpening. Molybdenum was coated on the some of the silicon tip array. Current-voltage characteristics and current fluctuations were tested in the high vacuum level. Turn-on voltage of the uncoated tip was 35 V and maximum current was 1 mA, while turn-on voltage of the coated tip was 15 V and maximum current was 6 mA. While uncoated silicon tip was destroyed after 13 minutes after operation and showed rapid lowering of emission current, coated tip showed stable emission characteristics. Obtained currents were proved to be field emission currents using the Fowler-Nordheim plot studies
Keywords :
electron field emission; molybdenum; silicon; vacuum microelectronics; 1 to 6 mA; 15 to 35 V; Fowler-Nordheim plot; Mo-coated Si field emitter array; MoSi; Si-Mo; current fluctuations; current-voltage characteristics; field emission; molybdenum silicide formation; re-oxidation sharpening; reactive ion etching; silicon tip; turn-on voltage; Coatings; Current-voltage characteristics; Etching; Field emitter arrays; Inorganic materials; Microelectronics; Scanning electron microscopy; Sensor arrays; Silicides; Silicon;
Conference_Titel :
Vacuum Microelectronics Conference, 1996. IVMC'96., 9th International
Conference_Location :
St. Petersburg
Print_ISBN :
0-7803-3594-5
DOI :
10.1109/IVMC.1996.601812